buffing

英 [ˈbʌfɪŋ]

美 [ˈbʌfɪŋ]

v.  用软布擦亮
buff的现在分词

机械

柯林斯词典

• COLOUR 浅棕色；米色
  Something that isbuffis pale brown in colour.
  1. He took a largish buff envelope from his pocket.
     他从口袋里掏出一个相当大的米色信封。
• N-COUNT 迷；行家
  You usebuffto describe someone who knows a lot about a particular subject. For example, if you describe someone as a filmbuff, you mean that they know a lot about films.
  1. Judge Lanier is a real film buff...
     拉尼尔法官是个真正的影迷。
  2. Any competent computer buff should be able to do it for you in a few minutes.
     任何一个有点儿水平的电脑行家都能在几分钟内为你解决这个问题。
• VERB 用软布擦亮
  If youbuffthe surface of something, for example your car or your shoes, you rub it with a piece of soft material in order to make it shine.
  1. He was already buffing the car's hubs.
     他已经在擦汽车轮毂了。

双语例句

• She is buffing her nails on her sleeve.
  她正用衣袖擦亮她的指甲。
• After buffing, a grey bloom forms over the treated surface.
  抹平后，处理过的表面会形成一道灰色的光晕。
• Advantage: Used for buffing or coloring to various shapes and materials.
  特点：适用于各种形状及材质的抛磨物件。
• For a bright glossy surface on your anodized part, steel wool or wet sand it and then polish it with a buffing wheel using tripoli compound.
  需要明亮的光泽，则需要用钢丝球或者湿的砂纸磨，之后用硅藻土抛光轮抛光。
• Chemical-Mechanical Polish ( CMP)-A process of flattening and polishing wafers that utilizes both chemical removal and mechanical buffing.
  化学-机械抛光（CMP）-平整和抛光晶圆片的工艺，采用化学移除和机械抛光两种方式。
• Mechanical Analysis of Novel Buffing Machine Type LP& 1000 and Manufacturing process of Buffing die
  新型抛光机LP&1000的机理分析与抛光模制作工艺
• Some swirl marks are too deep to safely remove and attempting to do so may result in buffing through the top layer of paint.
  有一些划痕太深，以至于不能被安全的去除，如果还想尝试去做的话，结果可能是机器会触到底漆。
• We talked a lot about buffing its damage, but decided that may not be a good idea.
  很多次我们谈论过提高它的伤害，但是又觉得这并不是个好主意。
• That enthusiasm means other kinds of hedge fund are busy buffing up their expertise in macro.
  投资者对宏观基金的热情使得其他类型的对冲基金们也开始对宏观跃跃欲试。
• Through the change two-sided buffing machine pressure and the speed parameter, the polishing fluid parameter and so on, we obtain the best craft parameter which the disk crystalline glass substrates are polished.
  通过改变双面抛光机压力和速度参数、抛光液参数等对磁盘微晶玻璃基板进行了抛光实验，得出磁盘微晶玻璃基板抛光的最佳工艺参数。